The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Jun. 30, 2003
Uldis A. Ziemins, Poughkeepsie, NY (US);
Donald J. Delehanty, Wappingers Falls, NY (US);
Raymond M. Khoury, Wappingers Falls, NY (US);
Jose M. Ocasio, Maybrook, NY (US);
Uldis A. Ziemins, Poughkeepsie, NY (US);
Donald J. Delehanty, Wappingers Falls, NY (US);
Raymond M. Khoury, Wappingers Falls, NY (US);
Jose M. Ocasio, Maybrook, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile