Wappingers Falls, NY, United States of America

Raymond M Khoury


Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 111(Granted Patents)


Location History:

  • Wappinger Falls, NY (US) (2001)
  • Wappingers Falls, NY (US) (2001 - 2005)

Company Filing History:


Years Active: 2001-2005

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9 patents (USPTO):

Title: The Innovative Contributions of Raymond M. Khoury

Introduction

Raymond M. Khoury is a notable inventor based in Wappingers Falls, NY, with a significant contribution to the field of semiconductor processing. He holds a total of nine patents, showcasing his expertise and innovative spirit in technology.

Latest Patents

Among his latest patents is the "Two-sided chemical mechanical polishing pad for semiconductor processing." This invention features a unitary body with a first side containing a plurality of holes and a second side with grooves, designed to enhance the efficiency of chemical mechanical polishing (CMP) processes. Another significant patent is "Wafer edge cleaning utilizing polish pad material," which improves a brush cleaning apparatus for wafers. This innovation incorporates polish pad material on the guide wheels, allowing for effective edge cleaning of the wafer in situ.

Career Highlights

Raymond M. Khoury is currently associated with International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in semiconductor processing. His work has been instrumental in advancing the efficiency and effectiveness of wafer cleaning and polishing techniques.

Collaborations

Throughout his career, Khoury has collaborated with talented individuals such as Jose M. Ocasio and Uldis Artis Ziemins, contributing to a dynamic and innovative work environment.

Conclusion

Raymond M. Khoury's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative solutions continue to impact the industry positively.

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