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For the Inventor, By the Inventor

Wappingers Falls, NY, United States of America

Raymond M Khoury

This inventor holds 9 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2001-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond M Khoury. Retrieved from https://idiyas.com/inventor/raymond-m-khoury

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9

% Patents Active = 77.8

Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 111(Granted Patents)


Location History:

  • Wappinger Falls, NY (US) (2001)
  • Wappingers Falls, NY (US) (2001 - 2005)

Company Filing History:

goldMedal9 out of 166,351 
 
International Business Machines Corporation
 patents

Years Active: 2001-2005

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9 patents (USPTO):Explore Patents
1. 6942549 - Two-sided chemical mechanical polishing pad for semiconductor processing (2005-09-13),
2. 6837777 - Wafer edge cleaning utilizing polish pad material (2005-01-04),
3. 6622334 - Wafer edge cleaning utilizing polish pad material (2003-09-23),
4. 6620029 - Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces (2003-09-16),
5. 6467120 - Wafer cleaning brush profile modification (2002-10-22),
6. 6343974 - Real-time method for profiling and conditioning chemical-mechanical polishing pads (2002-02-05),
7. 6334230 - Wafer cleaning apparatus (2002-01-01),
8. 6227948 - Polishing pad reconditioning via polishing pad material as conditioner (2001-05-08),
9. 6217422 - Light energy cleaning of polishing pads (2001-04-17),

Title: The Innovative Contributions of Raymond M. Khoury

Introduction

Raymond M. Khoury is a notable inventor based in Wappingers Falls, NY, with a significant contribution to the field of semiconductor processing. He holds a total of nine patents, showcasing his expertise and innovative spirit in technology.

Latest Patents

Among his latest patents is the "Two-sided chemical mechanical polishing pad for semiconductor processing." This invention features a unitary body with a first side containing a plurality of holes and a second side with grooves, designed to enhance the efficiency of chemical mechanical polishing (CMP) processes. Another significant patent is "Wafer edge cleaning utilizing polish pad material," which improves a brush cleaning apparatus for wafers. This innovation incorporates polish pad material on the guide wheels, allowing for effective edge cleaning of the wafer in situ.

Career Highlights

Raymond M. Khoury is currently associated with International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in semiconductor processing. His work has been instrumental in advancing the efficiency and effectiveness of wafer cleaning and polishing techniques.

Collaborations

Throughout his career, Khoury has collaborated with talented individuals such as Jose M. Ocasio and Uldis Artis Ziemins, contributing to a dynamic and innovative work environment.

Conclusion

Raymond M. Khoury's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative solutions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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