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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6217422 B1

PDFFull Text
Date of Patent:
Apr. 17, 2001

Filed:

Jan. 20, 1999

Light energy cleaning of polishing pads

Applicant:
Inventors:

Daniel L. Franca, Poughkeepsie, NY (US);

Raymond M. Khoury, Wappinger Falls, NY (US);

Jose M. Ocasio, Maybrook, NY (US);

Uldis A. Ziemins, Poughkeepsie, NY (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorney:

Pollock, Vande Sande & Amernick

Primary Examiner:

Timothy V Eley

Assistant Examiner:

Dung Van Nguyen

Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract

A method and apparatus for cleaning polishing debris from the surface of a polishing pad by wetting the surface with a liquid and irradiating the wetted surface with a beam of light. The light beam has sufficient intensity at the polishing surface of the pad to vaporize at least a portion of the liquid such that the vaporized liquid causes at least a portion of the debris to be expelled from the polishing surface of the pad.

Find Patent Forward Citations

Franca, Daniel. (2001). Light energy cleaning of polishing pads (U.S. Patent No. 6217422). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6217422

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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