Fei-Yuh Chen

Title: Innovations of Fei-Yuh Chen

Introduction

Fei-Yuh Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on enhancing the performance and efficiency of transistors, which are crucial components in modern electronic devices.

Latest Patents

Among his latest patents is a design for a transistor having a wing region. This innovative transistor includes an isolation region surrounding an active region, a gate dielectric layer over a portion of the active region, and a gate electrode positioned above the gate dielectric layer. The active region features a channel region situated between a drain region and a source region, with at least one wing region adjoining the channel region. The wing region can be polygonal or curved, providing unique advantages in transistor design. Another notable patent is for a high voltage drain-extended MOSFET that includes an extra drain-OD addition. This integrated circuit and its formation method involve creating a first well in a substrate, which has a first conductivity type, and forming a first source/drain region with a second conductivity type. A resistance protection ring is also integrated into the substrate, enhancing the device's reliability.

Career Highlights

Fei-Yuh Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of semiconductor technology and contribute to advancements in electronic components.

Collaborations

Fei-Yuh Chen has collaborated with notable colleagues, including Chen-Liang Chu and Yi-Sheng Chen, who is a talented woman in the field. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in semiconductor design.

Conclusion

Fei-Yuh Chen's contributions to the field of semiconductor technology are significant and impactful. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing electronic components. His work continues to influence the industry and pave the way for future innovations.