The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2006

Filed:

Feb. 10, 2005
Applicants:

Fei-yuh Chen, Hinchu, TW;

Eugene Chu, Cyonglin Township, Hsinchu County, TW;

Yuh-hwa Chang, Shulin, TW;

David Ho, Taichung, TW;

Inventors:

Fei-Yuh Chen, Hinchu, TW;

Eugene Chu, Cyonglin Township, Hsinchu County, TW;

Yuh-Hwa Chang, Shulin, TW;

David Ho, Taichung, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/44 (2006.01); H01L 21/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

A transparent substrate has a micro electro-mechanical system (MEMS) on a first side of the substrate. An opaque layer is formed on a second side of the transparent substrate opposite the first side. The opaque layer comprises a first material that is removable by a MEMS release process. A second layer is formed on the opaque layer. The second layer comprises a second material that prevents contamination of a front end of line machine by the first material during a front end of line fabrication process.


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