This inventor holds 5 USPTO granted patents and 1 EPO patent. Top assignees: Anelva Corporation, Hitachi-Kokusai Electric Inc., Sanyo Electric Co., Ltd.. Active years: 1984-2012.
Location History:
- Fuchu, JP (1992)
- Kyoto, JP (2005)
- Tokyo, JP (1984 - 2012)
Company Filing History:
3 out of 256 
3 out of 1,258 
3 out of 8,782 
Years Active: 1984-2012
Title: Etsuo Wani: Innovator in CVD Technology
Introduction
Etsuo Wani is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 5 patents to his name, Wani has developed innovative methods and apparatuses that enhance the efficiency and environmental sustainability of CVD processes.
Latest Patents
Wani's latest patents include a CVD apparatus and a method for cleaning the CVD apparatus. The cleaning method efficiently removes by-products such as SiO or SiN that adhere to and deposit on the surfaces of the inner wall and electrodes in a reaction chamber during the film-forming step. This method utilizes a minimal amount of discharged cleaning gas, thereby reducing environmental impacts such as global warming and lowering costs. Additionally, his CVD apparatus features an exhaust gas recycling path that recycles exhaust gas from the reaction chamber, further enhancing its efficiency.
Another notable patent is a device for cleaning the CVD apparatus, which effectively removes by-products stuck to the internal surfaces during the film-forming process. This apparatus includes a control system that monitors luminous intensity data of F radicals in the reaction chamber through optical emission spectroscopy. The system compares this data with pre-stored luminous intensity data to determine when cleaning should end, ensuring optimal performance.
Career Highlights
Etsuo Wani has worked with notable companies in the industry, including Anelva Corporation and Ulvac, Inc. His experience in these organizations has allowed him to refine his expertise in CVD technology and contribute to advancements in the field.
Collaborations
Wani has collaborated with esteemed colleagues such as Hitoshi Murata and Tsutomu Tsukada. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Etsuo Wani's contributions to CVD technology through his innovative patents and collaborations highlight his role as a leading inventor in the field. His work not only advances technological capabilities but also addresses environmental concerns, making a significant impact on the industry.