The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Mar. 12, 2004
Katsuo Sakai, Tokyo, JP;
Kaoru Abe, Tokyo, JP;
Seiji Okura, Tokyo, JP;
Masaji Sakamura, Tokyo, JP;
Hitoshi Murata, Tokyo, JP;
Kenji Kameda, Tokyo, JP;
Etsuo Wani, Tokyo, JP;
Akira Sekiya, Ibaraki, JP;
Katsuo Sakai, Tokyo, JP;
Kaoru Abe, Tokyo, JP;
Seiji Okura, Tokyo, JP;
Masaji Sakamura, Tokyo, JP;
Hitoshi Murata, Tokyo, JP;
Kenji Kameda, Tokyo, JP;
Etsuo Wani, Tokyo, JP;
Akira Sekiya, Ibaraki, JP;
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Ulvac, Inc., Chigasaki-shi, JP;
Sanyo Electric Co., Ltd., Moriguchi-shi, JP;
Sony Corporation, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Renesas Electronics Corporation, Kawasaki-shi, JP;
Fujitsu Semiconductor Limited, Yokohama-shi, JP;
Abstract
An apparatus for cleaning a CVD apparatus that can efficiently remove a by-product such as SiOor SiNstuck and deposited onto the surface of an internal wall, an electrode, or the like in a reaction chamber in a film forming process, and a method for cleaning a CVD apparatus. A control monitors luminous intensity data of an F radical in a reaction chamber by optical emission spectroscopy and compares the data with calibrated prestored luminous intensity data, and ends cleaning after a predetermined time passes from reaching a luminous intensity saturation point. Furthermore, concentration data of SiFin a gas discharged from the reaction chamber are monitored by a Fourier transform infrared spectrometry and compared with prestored concentration data of SiFto decide that the predetermined time has passed when a predetermined cleaning end point concentration is reached, thereby ending the cleaning.