Tokyo, Japan

Masaji Sakamura


Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Tatebayashi, JP (1998 - 2001)
  • Tokyo, JP (2011 - 2012)

Company Filing History:


Years Active: 1998-2012

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovator in Chemical Vapor Deposition: Masaji Sakamura

Introduction: Masaji Sakamura, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of chemical vapor deposition (CVD). With a total of four patents to his name, Sakamura has focused on innovative methods and apparatuses that enhance the efficiency and environmental sustainability of CVD processes.

Latest Patents: Among his latest groundbreaking inventions is a CVD apparatus and method for cleaning the CVD apparatus designed to effectively remove by-products like SiO or SiN from the surfaces of internal walls and electrodes within a reaction chamber during film formation. This cleaning method utilizes a minimal amount of discharged cleaning gas, thereby reducing environmental impacts associated with global warming and lowering operational costs. Additionally, Sakamura has developed a CVD apparatus that incorporates an exhaust gas recycling path, allowing for improved gas management during the deposition process.

Another notable invention is a device specifically tailored for cleaning CVD equipment. This apparatus can efficiently eliminate deposits of SiO or SiN from the internal surfaces during film formation. Utilizing cutting-edge control systems, it monitors luminous intensity data of fluorine radicals within the reaction chamber through optical emission spectroscopy, ensuring that cleaning concludes only after achieving optimal conditions. The device also employs Fourier transform infrared spectrometry to monitor SiF concentrations in the discharged gas, confirming that predetermined cleaning endpoints are reached before concluding the process.

Career Highlights: Throughout his career, Masaji Sakamura has worked with leading organizations, including Sanyo Electric Co., Ltd. and the National Institute of Advanced Industrial Science and Technology. His tenure at these institutions underscores his commitment to advancing technology in the field of CVD.

Collaborations: In his journey as an inventor, Sakamura has collaborated with accomplished professionals, including Masahiro Ono and Toshiharu Matsuda. These collaborations have likely contributed to the innovative solutions he has developed in the realm of CVD technology.

Conclusion: Masaji Sakamura's innovative spirit and commitment to improving CVD processes exemplify the importance of research and development in advancing technology. His latest patents not only showcase his engineering prowess but also reflect a dedication to environmental responsibility and efficiency in industrial applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…