Chandler, AZ, United States of America

Drew W Delaney

This inventor holds 14 USPTO granted patents and 3 published patent applications and 2 EPO patents, primarily in Microelectronic Packaging. Top assignee: Intel Corporation. Active years: 2006-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Drew W Delaney. Retrieved from https://idiyas.com/inventor/drew-w-delaney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14 

% Patents Active = 50.0

 

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 105(Granted Patents)


Location History:

  • Gilbert, AZ (US) (2006)
  • Chandler, AZ (US) (2012 - 2019)

Company Filing History:


Years Active: 2006-2019

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Areas of Expertise:
Interference Shield
Substrate
Bumpless Build-Up Layer
Warpage Reduction
Die-Stacking
Through-Silicon Vias
Coreless Packages
Microelectronic Assembly
Thin Film
Functionalized Carrier Structures
Adhesive Materials
14 patents (USPTO):Explore Patents

Title: The Innovations of Drew W. Delaney: A Leader in Microelectronics

Introduction

Drew W. Delaney, an accomplished inventor based in Chandler, Arizona, holds an impressive total of 14 patents. His work primarily focuses on advancements in microelectronics, specifically within the realm of packaging techniques that improve device performance. Delaney’s innovative designs contribute to the ongoing evolution of technology, showcasing his expertise in the field.

Latest Patents

Among his latest innovations, Delaney has developed a method for forming an interference shield on a substrate. This apparatus includes a die featuring a device side with contact points and lateral sidewalls, which define the thickness of the die. A build-up carrier is coupled to the die, consisting of alternating layers of patterned conductive material and insulating material. Notably, at least one layer of patterned conductive material connects to one of the contact points of the die. The interference shield, made of conductive material, is disposed on the die and a portion of the build-up carrier, allowing for connections to a printed circuit board.

Another recent patent focuses on bumpless build-up layer package warpage reduction. This innovation is relevant in the fabrication of microelectronic packages, specifically the formation of a bumpless build-up layer coreless (BBUL-C) microelectronic package. It incorporates a warpage control structure on the back surface of the microelectronic device, featuring a layered design that includes both high coefficient of thermal expansion materials and high elastic modulus material layers.

Career Highlights

Drew W. Delaney’s career is marked by his significant contributions to Intel Corporation, a global leader in semiconductor manufacturing. His dedication to advancing microelectronic technologies has established him as a prominent figure within the company and the industry. Delaney's innovations not only enhance performance but also push the boundaries of what is possible in microelectronics.

Collaborations

During his career, Delaney has worked alongside other notable inventors, including Ravi Kiran Nalla and John Stephen Guzek. This collaborative spirit fosters an environment of creativity and innovation, further propelling advancements in microelectronics and packaging techniques.

Conclusion

Drew W. Delaney exemplifies the essence of innovation in the field of microelectronics. With his dedicated work at Intel Corporation and a growing portfolio of patents, Delaney continues to make significant strides in enhancing device efficiency and performance. His contributions not only reflect his individual talent but also serve as a testament to the importance of collaboration in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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