Douglas H Burns

USPTO Granted Patents = 21 (Patent Applications = 4)

Average Co-Inventor Count = 7.0

ph-index = 9

Forward Citations = 213(Granted Patents)

Location History:

Saratoaga, CA (US) (2011)
Saratoga, CA (US) (2006 - 2015)

Company Filing History:

16 out of 13,684

Applied Materials, Inc.

patents

7 out of 22

Advanced Thermal Sciences Corporation

Applied Material, Inc.

patents

where one patent can have more than one assignee

Years Active: 2006-2015

where 'Filed Patents' based on already Granted Patents

21 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8980044 - Plasma reactor with a multiple zone thermal control feed forward control apparatus (2015-03-17),

2. 8801893 - Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor (2014-08-12),

3. 8608900 - Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes (2013-12-17),

4. 8546267 - Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control (2013-10-01),

5. 8337660 - Capacitively coupled plasma reactor having very agile wafer temperature control (2012-12-25),

6. 8329586 - Method of processing a workpiece in a plasma reactor using feed forward thermal control (2012-12-11),

7. 8221580 - Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops (2012-07-17),

8. 8157951 - Capacitively coupled plasma reactor having very agile wafer temperature control (2012-04-17),

9. 8092639 - Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes (2012-01-10),

10. 8092638 - Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution (2012-01-10),

11. 8048806 - Methods to avoid unstable plasma states during a process transition (2011-11-01),

12. 8034180 - Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor (2011-10-11),

13. 8021521 - Method for agile workpiece temperature control in a plasma reactor using a thermal model (2011-09-20),

14. 8012304 - Plasma reactor with a multiple zone thermal control feed forward control apparatus (2011-09-06),

15. 8011381 - Balanced purge slit valve (2011-09-06),

Title: The Innovative Journey of Douglas H Burns

Introduction:

Douglas H Burns is a renowned inventor based in Saratoga, CA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents:

Douglas H Burns holds several patents in various technological domains, including artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and forward-thinking approach.

Career Highlights:

With a career spanning over two decades, Douglas H Burns has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized industries worldwide. His passion for innovation and problem-solving has led to the creation of numerous groundbreaking inventions.

Collaborations:

Throughout his career, Douglas H Burns has collaborated with top engineers, scientists, and researchers to bring his ideas to life. His ability to work in multidisciplinary teams and his knack for identifying emerging trends have set him apart as a visionary inventor in the tech community.

Conclusion:

In conclusion, Douglas H Burns continues to push the boundaries of innovation, inspiring the next generation of inventors to think outside the box and create solutions that shape the future. His dedication to excellence and his relentless pursuit of knowledge make him a true pioneer in the world of technology.

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4 patents pending:

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1 patent pending (EPO):

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