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For the Inventor, By the Inventor

Hwaseong-si, South Korea

Doo-Hoon Goo

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Busan, KR (2004)
  • Suwon-si, KR (2006)
  • Gyeonggi-do, KR (2006 - 2011)
  • Hwaseong-si, KR (2007 - 2012)

Company Filing History:

goldMedal10 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2004-2012

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10 patents (USPTO):Explore Patents
1. 8287792 - Methods of forming fine patterns using a nanoimprint lithography (2012-10-16),
2. 8013374 - Semiconductor memory devices including offset bit lines (2011-09-06),
3. 7547936 - Semiconductor memory devices including offset active regions (2009-06-16),
4. 7375390 - Semiconductor memory device having high electrical performance and mask and photolithography friendliness (2008-05-20),
5. 7259065 - Method of forming trench in semiconductor device (2007-08-21),
6. 7221014 - DRAM devices having an increased density layout (2007-05-22),
7. 7176512 - Semiconductor memory device having high electrical performance and mask and photolithography friendliness (2007-02-13),
8. 7068371 - Methods and apparatus for aligning a wafer in which multiple light beams are used to scan alignment marks (2006-06-27),
9. 7064051 - Method of forming self-aligned contact pads of non-straight type semiconductor memory device (2006-06-20),
10. 6757052 - Single aperture optical system for photolithography systems (2004-06-29),

Title: Innovations of Doo-Hoon Goo

Introduction

Doo-Hoon Goo is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced methods for forming fine patterns and improving semiconductor memory devices.

Latest Patents

One of his latest patents involves methods of forming fine patterns using nanoimprint lithography. In this innovative method, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer, which includes at least two first patterns with varying sizes. A light is then irradiated onto the coating layer through the template, resulting in a cured coating layer with second patterns that have a more refined size dispersion degree. This advancement allows for improved precision in the formation of fine patterns.

Another notable patent by Goo pertains to semiconductor memory devices that include offset bit lines. This design features a substrate with multiple active regions, each having a specific length and width. The arrangement of wordline pairs and bitlines enhances the electrical coupling of the active regions, optimizing the performance of semiconductor memory devices.

Career Highlights

Doo-Hoon Goo is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has positioned him as a key player in the development of cutting-edge semiconductor technologies.

Collaborations

Throughout his career, Goo has collaborated with talented coworkers such as Gi-Sung Yeo and Jung-hyeon Lee. These collaborations have contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

Doo-Hoon Goo's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a significant inventor in the industry. His innovative methods and designs continue to influence advancements in semiconductor memory devices and pattern formation techniques.

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