The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

May. 13, 2009
Applicants:

Doo-hoon Goo, Gyeonggi-do, KR;

Han-ku Cho, Gyeonggi-do, KR;

Joo-tae Moon, Gyeonggi-do, KR;

Sang-gyun Woo, Gyeonggi-do, KR;

Gi-sung Yeo, Seoul, KR;

Kyoung-yun Baek, Gyeonggi-do, KR;

Inventors:

Doo-Hoon Goo, Gyeonggi-do, KR;

Han-Ku Cho, Gyeonggi-do, KR;

Joo-Tae Moon, Gyeonggi-do, KR;

Sang-Gyun Woo, Gyeonggi-do, KR;

Gi-Sung Yeo, Seoul, KR;

Kyoung-Yun Baek, Gyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor memory device may include a substrate having a plurality of active regions wherein each active region has a length in a direction of a first axis and a width in a direction of a second axis. The length may be greater than the width, and the plurality of active regions may be provided in a plurality of columns of active regions in the direction of the second axis. A plurality of wordline pairs may be provided on the substrate, with each wordline pair crossing active regions of a respective column of active regions defining a drain portion of each active region between wordlines of the respective wordline pair. A plurality of bitlines on the substrate may cross the plurality of wordline pairs, with each bitline being electrically coupled to a respective drain portion of an active region of each column, and with each bitline being arranged between the respective drain portion and another drain portion of an adjacent active region of the same column.


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