The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Jan. 27, 2010
Jeong-hoon Lee, Yongin-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Joo-on Park, Suwon-si, KR;
In-sung Kim, Suwon-si, KR;
Doo-hoon Goo, Hwaseong-si, KR;
Jin-hong Park, Hwaseong-si, KR;
Chang-min Park, Incheon, KR;
Jeong-Hoon Lee, Yongin-si, KR;
Jeong-Ho Yeo, Suwon-si, KR;
Joo-On Park, Suwon-si, KR;
In-Sung Kim, Suwon-si, KR;
Doo-Hoon Goo, Hwaseong-si, KR;
Jin-Hong Park, Hwaseong-si, KR;
Chang-Min Park, Incheon, KR;
Abstract
In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.