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For the Inventor, By the Inventor

Suwon-si, South Korea

In-Sung Kim

USPTO Granted Patents = 14 

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 34(Granted Patents)


Location History:

  • Suwon, KR (2006 - 2008)
  • Suwon-si, KR (2009 - 2015)
  • Seongnam-si, KR (2008 - 2018)

Company Filing History:

goldMedal14 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2006-2018

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14 patents (USPTO):Explore Patents
1. 9867267 - Extreme ultraviolet light source device (2018-01-09),
2. 9658522 - Reflective extreme ultraviolet mask (2017-05-23),
3. 9645484 - Reflective masks for use in extreme ultraviolet lithography apparatus and methods of manufacturing the same (2017-05-09),
4. 9116438 - Method of correcting flare and method of preparing extreme ultra violet mask (2015-08-25),
5. 8599360 - Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck (2013-12-03),
6. 8287792 - Methods of forming fine patterns using a nanoimprint lithography (2012-10-16),
7. 8158958 - Flare evaluation methods (2012-04-17),
8. 8119309 - Reflective photomask and method of fabricating, reflective illumination system and method of process using the same (2012-02-21),
9. 7635547 - Stencil mask having main and auxiliary strut and method of forming the same (2009-12-22),
10. 7475383 - Method of fabricating photo mask (2009-01-06),
11. 7384711 - Stencil mask having main and auxiliary strut and method of forming the same (2008-06-10),
12. 7361433 - Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same (2008-04-22),
13. 7300746 - Photomask for forming small contact hole array and methods of fabricating and using the same (2007-11-27),
14. 7022438 - Photomask for forming small contact hole array and methods of fabricating and using the same (2006-04-04),

Title: In-Sung Kim: Innovator in Extreme Ultraviolet Light Technology

Introduction

In-Sung Kim is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) light technology, holding a total of 14 patents. His work is instrumental in advancing the capabilities of EUV light sources, which are crucial for various applications in semiconductor manufacturing.

Latest Patents

Among his latest patents, the "Extreme Ultraviolet Light Source Device" stands out. This device features a source droplet generator that produces source droplets as targets for generating EUV light. It also includes a light irradiator that directs detection light to the injection path of the source droplets, and a light detector that identifies detection light blocked by the source droplet. Additionally, a source droplet controller is integrated to analyze the detection light and control the formation of a stream of source droplets based on the analysis. Another notable patent is the "Reflective Extreme Ultraviolet Mask," which consists of a mask substrate with a reflecting layer and an absorbing layer pattern. This design includes a grating pattern in the peripheral region to reduce the reflectivity of light incident on that area.

Career Highlights

In-Sung Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop advanced technologies in the field of EUV light sources. His work has been pivotal in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Chang-min Park and Young-Seog Kang, contributing to the advancement of their shared projects and innovations.

Conclusion

In-Sung Kim's contributions to extreme ultraviolet light technology exemplify his dedication to innovation and excellence in the field. His patents and work at Samsung Electronics Co., Ltd. continue to shape the future of semiconductor manufacturing.

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