The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Feb. 12, 2010
Applicants:
Dong-gun Lee, Hwaseong-si, KR;
Seong-sue Kim, Seoul, KR;
Hwan-seok Seo, Suwon-si, KR;
In-sung Kim, Suwon-si, KR;
Inventors:
Dong-Gun Lee, Hwaseong-si, KR;
Seong-Sue Kim, Seoul, KR;
Hwan-Seok Seo, Suwon-si, KR;
In-Sung Kim, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the capping layer, the light absorption pattern including at least one slit exposing the surface portion of the capping layer having the bent shape.