Hwan-seok Seo

Title: Hwan-seok Seo: Innovator in Reflective Mask Technology

Introduction

Hwan-seok Seo is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of lithography through his innovative patents. With a total of 5 patents to his name, Seo has established himself as a key figure in the development of advanced reflective masks.

Latest Patents

Seo's latest patents focus on reflective masks for use in extreme ultraviolet lithography apparatus. One of his notable inventions includes a reflective mask that features a reflective multi-layer on a mask substrate. This design incorporates a plurality of support patterns that are strategically spaced apart within the main trench. These support patterns correspond to areas of the reflective mask that are not transferred onto an exposure target substrate. Additionally, the reflective mask includes a light absorption pattern with multiple auxiliary light absorption patterns located in the auxiliary trenches. Another significant patent involves reflective photomask blanks, which consist of a multi-layered reflection layer on a photomask substrate, along with a capping layer that contains transition metal and silicon.

Career Highlights

Hwan-seok Seo is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in the field of lithography. His work has been instrumental in enhancing the efficiency and effectiveness of photomask technology.

Collaborations

Seo collaborates with talented colleagues, including Seong-sue Kim and Dong-gun Lee, who contribute to the innovative projects at Samsung Electronics Co., Ltd. Their teamwork fosters a creative environment that leads to groundbreaking advancements in the industry.

Conclusion

Hwan-seok Seo's contributions to reflective mask technology have positioned him as a leading inventor in the field. His innovative patents and collaborations with skilled professionals continue to drive advancements in lithography.