The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2013

Filed:

Nov. 17, 2010
Applicants:

Jin-seok Heo, Suwon-si, KR;

Chang-min Park, Hwaseong-si, KR;

Jeong-ho Yeo, Suwon-si, KR;

Joo-on Park, Suwon-si, KR;

In-sung Kim, Suwon-si, KR;

Inventors:

Jin-Seok Heo, Suwon-si, KR;

Chang-Min Park, Hwaseong-si, KR;

Jeong-Ho Yeo, Suwon-si, KR;

Joo-On Park, Suwon-si, KR;

In-Sung Kim, Suwon-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); G03F 7/70708 (2013.01);
Abstract

Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that together provide a securing surface for the reflective reticle. The mobile portion may alter a height of the securing surface relative to the fixed portion.


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