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For the Inventor, By the Inventor

Gyeonggi-do, South Korea

Chang-min Park

USPTO Granted Patents = 33

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 248(Granted Patents)


Location History:

  • Suwon, KR (2001 - 2005)
  • Gyeonggi-do, KR (2006 - 2010)
  • Suwon-si, KR (2008 - 2013)
  • Hwaseong-si, KR (2012 - 2018)

Company Filing History:

goldMedal33 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2001-2018

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33 patents (USPTO):
1. 9996009 - Extreme ultraviolet (EUV) exposure system and method of manufacturing semiconductor device using the same (2018-06-12),
2. 9885953 - Method of manufacturing a mask (2018-02-06),
3. 9874809 - Pellicle for a reflective mask and reflective mask assembly including the same (2018-01-23),
4. 9658522 - Reflective extreme ultraviolet mask (2017-05-23),
5. 9632437 - Lithography apparatus, method for lithography and stage system (2017-04-25),
6. 9575421 - Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same (2017-02-21),
7. 9256124 - Apparatus for manufacturing a mask (2016-02-09),
8. 9057954 - Apparatus for creating an extreme ultraviolet light, an exposing apparatus including the same, and electronic devices manufactured using the exposing apparatus (2015-06-16),
9. 8877634 - Methods of forming a fine pattern on a substrate and methods of forming a semiconductor device having a fine pattern (2014-11-04),
10. 8625110 - Methods of inspecting structures (2014-01-07),
11. RE44660 - Optical disc having a plurality of recording layers, and recording method and reproducing method therefor (2013-12-23),
12. 8599360 - Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck (2013-12-03),
13. 8557131 - Methods of forming fine patterns and methods of fabricating semiconductor devices (2013-10-15),
14. 8158958 - Flare evaluation methods (2012-04-17),
15. 7817506 - Method of transferring data with respect to an optical information storage medium having different track pitches (2010-10-19),

Title: Chang-min Park: Innovator in Semiconductor Technology

Introduction

Chang-min Park is a renowned inventor based in Gyeonggi-do, South Korea, holding an impressive total of 33 patents. His innovative contributions primarily revolve around advancements in semiconductor technology, particularly in exposure systems that enhance manufacturing processes.

Latest Patents

One of Park's latest patents includes an extreme ultraviolet (EUV) exposure system designed to improve the yield and productivity of EUV exposure processes. This system comprises an EUV exposure apparatus that performs EUV exposure on wafers, a load-lock chamber for the efficient supply and discharge of wafers, and a UV exposure apparatus that applies UV light to the entire upper surface of the wafer without the need for a mask.

Another significant patent by Park details a method of manufacturing a mask. This method involves dividing the upper surface of a template with a design pattern into multiple regions, correcting any distortions, and pressing the template onto a polymer layer to form a corresponding mask pattern, which is then cured for durability.

Career Highlights

Chang-min Park has made significant strides in the field of technology while working with prominent companies such as Samsung Electronics Co., Ltd. His expertise in semiconductor technology has played a crucial role in the development of cutting-edge electronic devices.

Collaborations

Throughout his career, Park has collaborated with notable colleagues, including Kyung-geun Lee and In-sik Park. Their collective efforts have contributed significantly to the advancements in semiconductor manufacturing techniques.

Conclusion

In summary, Chang-min Park's contributions to the semiconductor industry through his innovative patents and collaborative efforts with esteemed colleagues underscore his status as a key figure in technological advancements. His work continues to shape the future of semiconductor manufacturing, benefiting the industry and enhancing productivity across various applications.

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