The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Mar. 26, 2010
In-sung Kim, Suwon-si, KR;
Jooon Park, Suwon-si, KR;
Doo-hoo Goo, Hwaseong-si, KR;
Jeong-hoon Lee, Yongin-si, KR;
Chang-min Park, Hwaseong-si, KR;
In-Sung Kim, Suwon-si, KR;
Jooon Park, Suwon-si, KR;
Doo-Hoo Goo, Hwaseong-si, KR;
Jeong-Hoon Lee, Yongin-si, KR;
Chang-Min Park, Hwaseong-si, KR;
Samsung Electronics Co. Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.