The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Mar. 30, 2010
Seouk-hoon Woo, Hwaseong-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Byeong-ok Cho, Seoul, KR;
Joo-on Park, Suwon-si, KR;
Chang-min Park, Hwaseong-si, KR;
Won-sun Kim, Suwon-si, KR;
Seouk-Hoon Woo, Hwaseong-si, KR;
Jeong-Ho Yeo, Suwon-si, KR;
Byeong-Ok Cho, Seoul, KR;
Joo-On Park, Suwon-si, KR;
Chang-Min Park, Hwaseong-si, KR;
Won-Sun Kim, Suwon-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-Do, KR;
Abstract
A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum.