Introduction: DongQing Li, a prominent inventor based in Santa Clara, California, has made significant contributions to the field of materials science and engineering. With an impressive portfolio of 20 patents, he has focused on innovations related to the post-treatment of dielectric films and advanced film deposition techniques. His work not only pushes the boundaries of technology but also addresses critical challenges in the industry.

Latest Patents: DongQing Li's most recent patents exemplify his commitment to innovation. One notable invention is the method of post-treating dielectric films with microwave radiation. This method involves positioning a substrate with a dielectric film in a processing chamber, where it is exposed to microwave radiation at frequencies between 5 GHz and 7 GHz. This technique enhances the material properties of the dielectric films, making them more effective for various applications.

Another significant patent is the integration of dual remote plasma sources for flowable chemical vapor deposition (CVD). This apparatus optimizes film formation by utilizing two remote plasma sources—one for delivering deposition radicals and another for introducing cleaning radicals. This design minimizes cross-contamination and enhances the efficiency of the deposition process, showcasing Li's innovative approach to addressing industry needs.

Career Highlights: DongQing Li has built a successful career at Applied Materials, Inc., a leader in materials engineering solutions. His expertise in dielectric film technologies has positioned him as a key player within the company, allowing him to contribute to groundbreaking advancements in semiconductor manufacturing and materials processing.

Collaborations: Throughout his career, Li has collaborated with esteemed colleagues, including Xiaolin C Chen and Zhengquan Tan. These partnerships have fostered a rich environment for innovation, leading to the development of numerous patents that enhance the performance of materials used in high-tech applications.

Conclusion: DongQing Li's remarkable journey as an inventor underscores his dedication to pushing the frontiers of technology in dielectric film processing. With a strong focus on innovation and collaboration, he continues to impact the field significantly, paving the way for future advancements in materials science. His contributions not only reflect his inventiveness but also exemplify the spirit of discovery that drives the technology industry forward.

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