The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2006
Filed:
May. 23, 2003
Lin Zhang, San Jose, CA (US);
Xiaolin Chen, San Jose, CA (US);
Dongqing LI, Santa Clara, CA (US);
Thanh N Pham, San Jose, CA (US);
Farhad K Moghadam, Saratoga, CA (US);
Zhuang LI, San Jose, CA (US);
Padmanabhan Krishnaraj, San Francisco, CA (US);
Lin Zhang, San Jose, CA (US);
Xiaolin Chen, San Jose, CA (US);
DongQing Li, Santa Clara, CA (US);
Thanh N Pham, San Jose, CA (US);
Farhad K Moghadam, Saratoga, CA (US);
Zhuang Li, San Jose, CA (US);
Padmanabhan Krishnaraj, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A deposition/etching/deposition process is provided for filling a gap in a surface of a substrate. A liner is formed over the substrate so that distinctive reaction products are formed when it is exposed to a chemical etchant. The detection of such reaction products thus indicates that the portion of the film deposited during the first etching has been removed to an extent that further exposure to the etchant may remove the liner and expose underlying structures. Accordingly, the etching is stopped upon detection of distinctive reaction products and the next deposition in the deposition/etching/deposition process is begun.