The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Apr. 21, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Daemian Raj, Fremont, CA (US);
Ying Ma, Castro Valley, CA (US);
DongQing Li, Fremont, CA (US);
Jay D. Pinson, II, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/50 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); C23C 16/452 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/50 (2013.01); C23C 16/4401 (2013.01); C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23C 16/452 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/54 (2013.01); H01J 37/32449 (2013.01); H01J 37/32899 (2013.01);
Abstract
A method and apparatus for a deposition chamber is provided and includes a twin chamber that includes a first remote plasma system coupled and dedicated to a first processing region, a second remote plasma system coupled and dedicated to a second processing region, and a third remote plasma system shared by the first processing region and the second processing region.