Dong-chan Lim is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 17 patents. His work focuses on advanced processes and apparatuses that enhance semiconductor manufacturing.

Latest Patents

Among his latest patents is an innovative ion beam source. This device includes a plasma chamber designed to generate plasma, along with a first and second grid that facilitate the movement of the first grid relative to the second. Another notable patent involves a substrate process apparatus that utilizes this ion beam source. Additionally, he has developed methods for processing substrates that are crucial for semiconductor devices. One of his semiconductor device patents describes a structure that includes a conductive component on a substrate, a passivation layer, and a pad structure that ensures electrical connectivity.

Career Highlights

Dong-chan Lim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing new methods and devices that improve the efficiency and performance of semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Gil-heyun Choi and Byung-Lyul Park, contributing to various projects that enhance their collective expertise in the field.

Conclusion

Dong-chan Lim's innovative contributions to semiconductor technology and his extensive patent portfolio underscore his role as a leading inventor in the industry. His work continues to influence advancements in semiconductor manufacturing processes.

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