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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12224163 B1

PDFFull Text
Date of Patent:
Feb. 11, 2025

Filed:

Aug. 15, 2023

Ion beam source, substrate process apparatus including the same, and method of processing a substrate using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

SeungWan Yoo, Suwon-si, KR;

Jeongyeon Lee, Suwon-si, KR;

Dohyung Kim, Suwon-si, KR;

Jaehong Park, Suwon-si, KR;

Dong-Chan Lim, Suwon-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

David A Vanore

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/34 (2006.01); H01J 27/02 (2006.01); H01J 37/08 (2006.01); H01J 37/305 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32697 (2013.01); C23C 14/3442 (2013.01); H01J 27/024 (2013.01); H01J 37/08 (2013.01); H01J 37/3053 (2013.01); H01J 37/3211 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/34 (2013.01); H01J 2237/081 (2013.01); H01J 2237/332 (2013.01);
Abstract

An ion beam source including a plasma chamber including a plasma generating space, a plasma generator configured to generate plasma in the plasma generating space, a first grid connected to the plasma chamber, a second grid connected to the plasma chamber, and a first grid driver connected to the first grid. The first grid driver may be configured to move the first grid relative to the second grid.

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Quick Actions:

Yoo, SeungWan. (2025). Ion beam source, substrate process apparatus including the same, and method of processing a substrate using the same (U.S. Patent No. 12224163). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12224163

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