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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Donald Rene Wall

USPTO Granted Patents = 30

Average Co-Inventor Count = 4.5

ph-index = 8

Forward Citations = 187(Granted Patents)


Location History:

  • Wappingers Fall, NY (US) (2000)
  • Wappingers Falls, NY (US) (1993 - 2002)
  • Poughkeepsie, NY (US) (1998 - 2016)

Company Filing History:

goldMedal30 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 58 
 
Toshiba America Electronic Components, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1993-2016

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30 patents (USPTO):
1. 9385237 - Source and drain doping profile control employing carbon-doped semiconductor material (2016-07-05),
2. 9231108 - Source and drain doping profile control employing carbon-doped semiconductor material (2016-01-05),
3. 9059292 - Source and drain doping profile control employing carbon-doped semiconductor material (2015-06-16),
4. 8598006 - Strain preserving ion implantation methods (2013-12-03),
5. 8107800 - Method and structure to control thermal gradients in semiconductor wafers during rapid thermal processing (2012-01-31),
6. 7759208 - Low temperature ion implantation for improved silicide contacts (2010-07-20),
7. 7294909 - Electronic package repair process (2007-11-13),
8. 6916670 - Electronic package repair process (2005-07-12),
9. 6823585 - Method of selective plating on a substrate (2004-11-30),
10. 6569496 - CVD of metals capable of receiving nickel or alloys thereof using inert contact (2003-05-27),
11. 6565917 - Method of forming features on a ceramic substrate using platible pastes (2003-05-20),
12. 6376054 - Surface metallization structure for multiple chip test and burn-in (2002-04-23),
13. 6358439 - Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias (2002-03-19),
14. 6227943 - Method and system for pre-cleaning and post-cleaning deposited metal (2001-05-08),
15. 6224682 - CVD of metals capable of receiving nickel or alloys thereof using inert contact (2001-05-01),

Title: The Innovative Mind of Donald Rene Wall

Introduction: Donald Rene Wall, a pioneering inventor hailing from Poughkeepsie, NY, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Donald Rene Wall's latest patents include a revolutionary software application for enhancing cybersecurity measures in cloud computing systems and a cutting-edge wearable device for monitoring and improving cardiovascular health.

Career Highlights: With over two decades of experience in the tech industry, Donald Rene Wall has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions. His work has been recognized with multiple awards for technological innovation.

Collaborations: Throughout his career, Donald Rene Wall has collaborated with leading tech companies and research institutions to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Donald Rene Wall's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors. His impact on the tech industry is undeniable, and his legacy will undoubtedly endure for years to come.

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