The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Mar. 27, 2009
Asa Frye, Lagrangeville, NY (US);
Christian Lavoie, Pleasantville, NY (US);
Ahmet S. Ozcan, Pleasantville, NY (US);
Donald R. Wall, Poughkeepsie, NY (US);
Asa Frye, Lagrangeville, NY (US);
Christian Lavoie, Pleasantville, NY (US);
Ahmet S. Ozcan, Pleasantville, NY (US);
Donald R. Wall, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Embodiments of the present invention provide a method that cools a substrate to a temperature below 10° C. and then implants ions into the substrate while the temperature of the substrate is below 10° C. The implanting causes damage to a first depth of the substrate to create an amorphized region in the substrate. The method forms a layer of metal on the substrate and heats the substrate until the metal reacts with the substrate and forms a silicide region within the amorphized region of the substrate. The depth of the silicide region is at least as deep as the first depth.