Dominique Suhr

Title: Innovations of Dominique Suhr

Introduction

Dominique Suhr is a notable inventor based in Chatenay Malabry, France. He holds a total of nine patents, showcasing his contributions to the field of electrochemistry and semiconductor technology. His work has significantly impacted the processes involved in electrodeposition and electroplating.

Latest Patents

One of his latest patents is a process for the electrodeposition of cobalt. This invention relates to the fabrication of cobalt interconnections and introduces an electrolyte with a pH below 4.0, which comprises cobalt ions, chloride ions, and at most two organic additives of low molecular weight. One of these additives may be an alpha-hydroxy carboxylic acid or a compound with a pKa value ranging from 1.8 to 3.5. Another significant patent involves an electrolyte and process for electroplating copper onto a barrier layer. This invention features an electrolyte composition for depositing copper on semiconductor substrates covered with a barrier layer. The electrolyte contains a combination of imidazole and 2,2'-bipyridine as suppressors, along with thiodiglycolic acid as an accelerator. This combination allows for bottom-up filling in trenches of very small width, typically less than 100 nm.

Career Highlights

Throughout his career, Dominique Suhr has worked with several companies, including Alchimer and Aveni. His expertise in electrochemical processes has made him a valuable asset in the development of innovative technologies.

Collaborations

He has collaborated with notable coworkers such as Vincent Mevellec and Laurianne Religieux, contributing to advancements in their respective fields.

Conclusion

Dominique Suhr's innovative patents and career achievements highlight his significant contributions to electrochemistry and semiconductor technology. His work continues to influence the industry and inspire future innovations.