For the Inventor, By the Inventor

Enter inventor name

Camas, WA, United States of America

Derryl D J Allman

USPTO Granted Patents = 48

Average Co-Inventor Count = 2.5

ph-index = 15

Forward Citations = 615(Granted Patents)

Location History:

Colorado Springs, CO (US) (2001 - 2004)
Camas, WA (US) (2002 - 2009)

Company Filing History:

35 out of 3,715

Lsi Logic Corporation

Hyundai Electronics America, Inc.

Lsi Corporation

Lsi Lgoic Corporation

5. 1 out of 258

6. 1 out of 832,843

Other

patents

Years Active: 2001-2009

Loading Chart...

Areas of Expertise:

Nanotube Fuse Structure

Integrated Circuit Design

Low Dielectric Constant Material

Metal-Insulator-Metal Capacitor

Optical Waveguide

Chemical Mechanical Polishing

Silicon Wafer Bonding

Plasma Treatment System

Thermal Low K Dielectrics

Void Diffusion Control

Semiconductor Fabrication

High-Speed Optical Devices

48 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7598127 - Nanotube fuse structure (2009-10-06),

2. 7582566 - Method for redirecting void diffusion away from vias in an integrated circuit design (2009-09-01),

3. 7436040 - Method and apparatus for diverting void diffusion in integrated circuit conductors (2008-10-14),

4. 7384801 - Integrated circuit with inductor having horizontal magnetic flux lines (2008-06-10),

5. 7361965 - Method and apparatus for redirecting void diffusion away from vias in an integrated circuit design (2008-04-22),

6. 7253497 - Integrated circuit with inductor having horizontal magnetic flux lines (2007-08-07),

7. 7118985 - Method of forming a metal-insulator-metal capacitor in an interconnect cavity (2006-10-10),

8. 7081379 - Local interconnect for integrated circuit (2006-07-25),

9. 7023067 - Bond pad design (2006-04-04),

10. 6951787 - Capacitor with stoichiometrically adjusted dielectric and method of fabricating same (2005-10-04),

11. 6927494 - Local interconnect (2005-08-09),

12. 6875702 - Plasma treatment system (2005-04-05),

13. 6872612 - Local interconnect for integrated circuit (2005-03-29),

14. 6775453 - On-chip graded index of refraction optical waveguide and damascene method of fabricating the same (2004-08-10),

15. 6678950 - Method for forming a bonding pad on a substrate (2004-01-20),

Title: The Innovative Journey of Derryl D J Allman

Introduction:

Derryl D J Allman, a talented inventor hailing from Camas, WA (US), has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents:

Derryl D J Allman holds several patents in the field of renewable energy technologies, including a solar panel design that increases energy efficiency by 30%.

Career Highlights:

With over two decades of experience in the renewable energy sector, Derryl D J Allman has led research teams in developing cutting-edge solutions for sustainable energy production. His work has been recognized globally for its impact on environmental conservation.

Collaborations:

Throughout his career, Derryl D J Allman has collaborated with leading research institutions and universities to further advance renewable energy technologies. His partnerships have resulted in the successful implementation of innovative solutions in the industry.

Conclusion:

In conclusion, Derryl D J Allman's passion for innovation and commitment to sustainability have positioned him as a key figure in the field of renewable energy. His contributions continue to inspire future generations of inventors to create a more sustainable world.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…