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For the Inventor, By the Inventor

Newberry, FL, United States of America

Deepika Singh

USPTO Granted Patents = 16 

 

Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 34(Granted Patents)


Location History:

  • Gainesville, FL (US) (2011 - 2018)
  • Newberry, FL (US) (2014 - 2023)

Company Filing History:

goldMedal11 out of 12 
 
Sinmat, Inc.
 patents
silverMedal11 out of 2,925 
 
University of Florida Research Foundation, Incorporated
 patents
bronzeMedal4 out of 785 
 
Entegris, Inc.
 patents
4. 1 out of 1 
 
Entregis, Inc.
 patent
where one patent can have more than one assignee

Years Active: 2011-2023

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16 patents (USPTO):Explore Patents
1. 11840645 - CMP composition for polishing hard materials (2023-12-12),
2. 11820918 - Hard abrasive particle-free polishing of hard materials (2023-11-21),
3. 11213927 - CMP polishing pad conditioner (2022-01-04),
4. 11078380 - Hard abrasive particle-free polishing of hard materials (2021-08-03),
5. 10868899 - Film for applying compressive stress to ceramic materials (2020-12-15),
6. 9878420 - Method of chemical mechanical polishing of alumina (2018-01-30),
7. 9567492 - Polishing of hard substrates with soft-core composite particles (2017-02-14),
8. 9551075 - Chemical mechanical polishing of alumina (2017-01-24),
9. 9368367 - Chemical mechanical polishing of silicon carbide comprising surfaces (2016-06-14),
10. 9259819 - CMP method for forming smooth diamond surfaces (2016-02-16),
11. 9259818 - Smooth diamond surfaces and CMP method for forming (2016-02-16),
12. 8828874 - Chemical mechanical polishing of group III-nitride surfaces (2014-09-09),
13. 8652295 - CMP tool implementing cyclic self-limiting CM process (2014-02-18),
14. 8557133 - Chemical mechanical polishing of silicon carbide comprising surfaces (2013-10-15),
15. 8506835 - Cyclic self-limiting CMP removal and associated processing tool (2013-08-13),

Title: Deepika Singh: Innovator in Chemical Mechanical Polishing

Introduction

Deepika Singh is a prominent inventor based in Newberry, Florida, known for her significant contributions to the field of chemical mechanical polishing (CMP). With a total of 16 patents to her name, she has developed innovative solutions that enhance the polishing process of hard materials.

Latest Patents

Among her latest patents is a CMP composition for polishing hard materials. This invention includes a slurry that consists of an aqueous liquid carrier, an oxygen and anion containing transition metal compound, and a per-based oxidizer. The anion can include various compounds such as oxynitrate, oxychloride, and oxysulfate. Another notable patent is for a method of CMP that utilizes a slurry solution with specific concentrations of oxidizers and buffering agents, ensuring effective polishing without hard abrasive particles.

Career Highlights

Deepika has worked with notable organizations, including Sinmat, Inc. and the University of Florida Research Foundation, Incorporated. Her work has significantly impacted the field of CMP, leading to advancements in polishing techniques and materials.

Collaborations

Throughout her career, Deepika has collaborated with esteemed colleagues such as Rajiv K Singh and Arul Arjunan, contributing to various research projects and innovations in her field.

Conclusion

Deepika Singh's innovative work in chemical mechanical polishing has established her as a leading inventor in the industry. Her patents reflect her commitment to advancing technology and improving processes in material polishing.

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