The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Apr. 13, 2009
Rajiv K. Singh, Gainesville, FL (US);
Arul Chakkaravarthi Arjunan, Gainesville, FL (US);
Dibakar Das, Gainesville, FL (US);
Deepika Singh, Gainesville, FL (US);
Abhudaya Mishra, Gainesville, FL (US);
Tanjore V. Jayaraman, Gainesville, FL (US);
Rajiv K. Singh, Gainesville, FL (US);
Arul Chakkaravarthi Arjunan, Gainesville, FL (US);
Dibakar Das, Gainesville, FL (US);
Deepika Singh, Gainesville, FL (US);
Abhudaya Mishra, Gainesville, FL (US);
Tanjore V. Jayaraman, Gainesville, FL (US);
Sinmat, Inc., Gainesville, FL (US);
University of Florida Research Foundation, Inc., Gainesville, FL (US);
Abstract
Slurry compositions and chemically activated CMP methods for polishing a substrate having a silicon carbide surface using such slurries. In such methods, the silicon carbide surface is contacted with a CMP slurry composition that comprises i) a liquid carrier and ii) a plurality of particles having at least a soft surface portion, wherein the soft surface portion includes a transition metal compound that provides a Mohs hardness <6, and optionally iii) an oxidizing agent. The oxidizing agent can include a transition metal. The slurry is moved relative to the silicon carbide comprising surface, wherein at least a portion of the silicon carbide surface is removed.