Tanjore V Jayaraman

Title: Tanjore V Jayaraman: Innovator in Chemical Mechanical Polishing

Introduction

Tanjore V Jayaraman is a notable inventor based in Gainesville, FL (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the polishing of silicon carbide surfaces. With a total of 2 patents, his work has advanced the methods and materials used in this important area of technology.

Latest Patents

Jayaraman's latest patents focus on the development of slurry compositions and chemically activated methods for polishing substrates with silicon carbide surfaces. These methods involve contacting the silicon carbide surface with a CMP slurry composition that includes a liquid carrier and a plurality of particles with a soft surface portion. This soft surface portion contains a transition metal compound with a Mohs hardness of less than or equal to 6, along with an optional oxidizing agent, which may also include a transition metal. The innovative slurry is moved relative to the silicon carbide surface, effectively removing portions of the material during the polishing process.

Career Highlights

Throughout his career, Tanjore V Jayaraman has worked with reputable organizations such as Sinmat, Inc. and the University of Florida Research Foundation, Incorporated. His experience in these institutions has allowed him to refine his expertise in chemical mechanical polishing and contribute to advancements in the field.

Collaborations

Jayaraman has collaborated with notable colleagues, including Rajiv K Singh and Arul Arjunan. These partnerships have fostered innovation and development in his research endeavors.

Conclusion

Tanjore V Jayaraman's contributions to the field of chemical mechanical polishing have established him as a key inventor in this area. His innovative patents and collaborations reflect his commitment to advancing technology in silicon carbide surface polishing.