Gainesville, FL, United States of America

Arul Arjunan

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2013-2023

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11 patents (USPTO):Explore Patents

Title: The Innovative Mind of Arul Arjunan

Introduction

Arul Arjunan is a notable inventor based in Gainesville, FL, who has made significant contributions to the field of polishing hard materials through his innovative research and developments. With a remarkable portfolio of 11 patents, Arjunan harnesses his expertise to advance technologies that enhance manufacturing processes.

Latest Patents

One of Arul Arjunan's latest patents describes a method of chemical mechanical polishing (CMP) that employs a unique slurry solution. This solution includes greater than or equal to 1 per-compound oxidizer with a concentration ranging between 0.01 M and 2 M, adjusting the pH between 2 to 5 or 8 to 11. It also incorporates at least one buffering agent that ensures a buffering ratio of 1.5 or more compared to the required strong acid for pH reduction. Notably, this novel method is distinguished by the absence of hard slurry particles, using instead only soft slurry particles that possess a Vickers hardness of less than 300 Kg/mm or Mohs Hardness of less than 4. This innovative approach is utilized in conjunction with a polishing pad to effectively polish surfaces with a significantly higher Vickers hardness above 1,000 kg/mm.

Career Highlights

Arul Arjunan has worked in reputable organizations, including the University of Florida Research Foundation and Sinmat, Inc. His experience in these institutions underlines his dedication to advancing research and practical applications in his field.

Collaborations

Throughout his career, Arjunan has collaborated with several peers, including Rajiv K Singh and Deepika Singh. These partnerships have likely enriched his perspectives and contributed to the innovative nature of his patents.

Conclusion

Arul Arjunan exemplifies the spirit of innovation in the realm of materials engineering. With his extensive patent portfolio and collaborative efforts, he continues to pave the way for advancements that hold great potential for the industry. His work not only reflects personal ingenuity but also showcases the importance of collaboration in driving the future of polishing technologies.

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