The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Jan. 30, 2021
Entegris, Inc., Billerica, MA (US);
University of Florida Research Foundation, Inc., Gainesville, FL (US);
Rajiv K. Singh, Newberry, FL (US);
Sunny De, Gainesville, FL (US);
Deepika Singh, Newberry, FL (US);
Chaitanya Dnyanesh Ginde, Gainesville, FL (US);
Aditya Dilip Verma, Gainesville, FL (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
A slurry for chemical mechanical polishing (CMP) includes an aqueous liquid carrier, an oxygen and anion containing transition metal compound or polyatomic cations including a transition metal and oxygen or hydrogen, and a per-based oxidizer. The anion for the oxygen and anion containing transition metal compound can include oxynitrate, oxychloride, oxyhydroxide, oxyacetate, oxysulfide, or oxysulfate. The per-based oxidizer can be a permanganate compound.