This inventor holds 11 USPTO granted patents and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2008-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008-2026
Title: De-Fang Huang: Innovator in Photolithography
Introduction
De-Fang Huang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of photolithography, holding a total of nine patents. His work focuses on developing advanced methods and apparatuses that enhance the efficiency and effectiveness of lithographic processes.
Latest Patents
Among his latest patents is a method and apparatus for dynamic lithographic exposure. This innovation relates to a method of developing a photosensitive material, which involves forming the material over a substrate. The method includes exposing the photosensitive material to electromagnetic radiation that is focused at various heights above the substrate. These heights are vertically separated and positioned within the photosensitive material along a vertical path that is perpendicular to the upper surface. The development process removes a soluble region of the material. Another notable patent is a photolithography tool that features a source for generating electromagnetic radiation. This tool includes a dynamic focal system that provides the radiation to multiple vertical positions over a substrate stage, allowing for enhanced depth of focus.
Career Highlights
De-Fang Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing technologies.
Collaborations
Throughout his career, Huang has collaborated with notable colleagues, including Jun-Yih Yu and De-Chen Tseng. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
De-Fang Huang's contributions to photolithography and semiconductor manufacturing are noteworthy. His innovative patents and collaborations highlight his role as a key figure in advancing technology in this critical industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile