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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9541836 B1

PDFFull Text
Expired
Date of Patent:
Jan. 10, 2017

Filed:

Feb. 10, 2014

Method and apparatus for baking photoresist patterns

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd, Hsin-Chu, TW;

Inventors:

Chin-Min Lin, Zhudong Township, Hsinchu County, TW;

De-Fang Huang, Hsinchu, TW;

Ching-Hui Tsao, Zhudong Township, Hsinchu County, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsin-Chu, TW;

Attorney:

McClure, Qualey & Rodack, LLP

Primary Examiner:

Joseph M Pelham

Int. Cl.
CPC ...
F27B 5/14 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01); H01L 21/027 (2006.01); G03F 7/40 (2006.01); H01L 21/677 (2006.01); F27B 17/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); F27B 5/14 (2013.01); H01L 21/67103 (2013.01); H01L 21/67115 (2013.01); H01L 21/67748 (2013.01); F27B 17/0025 (2013.01); H01L 21/0271 (2013.01);
Abstract

In accordance with some embodiments, a method and an apparatus for baking photoresist patterns are provided. The method includes putting a wafer over a heating assembly. A photoresist pattern is formed over a top surface of the wafer. The method further includes curing the wafer from the top surface of the wafer by a curing assembly while heating the wafer from a bottom surface of the wafer by a heating assembly.

Find Patent Forward Citations

Lin, Chin-Min. (2017). Method and apparatus for baking photoresist patterns (U.S. Patent No. 9541836). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9541836

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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