The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Aug. 15, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Chun Lin Chen, Hsinchu, TW;
De-Fang Huang, Hsinchu, TW;
Chen-Chang Wu, Hsinchu, TW;
Chung-Nan Chen, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A method of using a lithographic system to perform lithography is provided. The lithographic system includes an illuminator and a projection apparatus. The illuminator is configured to output a light beam from a light source unit to a reticle through a beam shaping unit, a diffuser unit, a light pipe unit and an exposure control unit to generate a patterned light beam. The projection apparatus is configured to project the patterned light beam onto a wafer coated with a photoresist layer. The aperture of the diffuser unit is changed based on a dataset that is related a lithographic process and that includes a thickness of the photoresist layer and a numerical aperture value of a numerical aperture component of the projection apparatus. Then, the lithographic system performs the lithographic process on the wafer with the diffuser unit having the aperture thus changed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile