The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Mar. 16, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd, Hsinchu, TW;

Inventors:

Shing-Kuei Lai, Taichung, TW;

Wei-Yueh Tseng, Hsinchu, TW;

Hsiao-Yi Wang, Zhunan Township, TW;

De-Fang Huang, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); G03F 9/00 (2006.01); H01L 21/268 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G03F 7/2004 (2013.01); H01L 21/0274 (2013.01); H01L 21/2686 (2013.01); H01L 23/544 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54433 (2013.01);
Abstract

A method for aligning a semiconductor wafer is provided. The method includes providing the semiconductor wafer having two alignment marks formed on an active region or on an edge region of the semiconductor wafer. An included angle that is formed between the two alignment marks in a circumferential direction of the semiconductor wafer is between about 12 degrees and about 36 degrees. The method further includes receiving the detection signal reflected from at least one of the first alignment mark and the second alignment mark. The method also includes determining a parameter by a control system based on the received detection signal and moving the semiconductor wafer according to the parameter.


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