Santa Clara, CA, United States of America

David Y Wang

This inventor holds 32 USPTO granted patents and 8 published patent applications and 7 EPO patents. Top assignees: Kla Tencor Corporation, Kla Corporation, Kla Corporal. Active years: 2012-2025.

USPTO Granted Patents = 32 (Patent Applications = 8)

% Patents Active = 90.6

EPO Patents = 7 (Patent Applications = 13)

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 129(Granted Patents)

Location History:

Mesa, AZ (US) (2017)
Milpitas, CA (US) (2022)
Santa Clara, CA (US) (2012 - 2024)

Company Filing History:

19 out of 1,787

Kla Tencor Corporation

4. 1 out of 834,307

Other

patents

where one patent can have more than one assignee

Years Active: 2012-2025

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Areas of Expertise:

Optical Metrology

High Aspect Ratio Structures

Magneto-Optic Kerr Effect

X-Ray Scatterometry

Infrared Spectroscopy

Hyperspectral Imaging

Polarized Infrared Reflectometry

Ellipsometry

Semiconductor Metrology

Measurement Techniques

Compact Lens Technology

32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12461041 - Measurement of thick films and high aspect ratio structures (2025-11-04),

2. 12449352 - Optics for measurement of thick films and high aspect ratio structures (2025-10-21),

3. 12164093 - Reflective compact lens for magneto-optic Kerr effect metrology system (2024-12-10),

4. 12013355 - Methods and systems for compact, small spot size soft x-ray scatterometry (2024-06-18),

5. 11913874 - Optical metrology tool equipped with modulated illumination sources (2024-02-27),

6. 11906770 - Monolithic optical retarder (2024-02-20),

7. 11309202 - Overlay metrology on bonded wafers (2022-04-19),

8. 11231362 - Multi-environment polarized infrared reflectometer for semiconductor metrology (2022-01-25),

9. 11137350 - Mid-infrared spectroscopy for measurement of high aspect ratio structures (2021-10-05),

10. 11119050 - Methods and systems for measurement of thick films and high aspect ratio structures (2021-09-14),

11. 11043239 - Magneto-optic Kerr effect metrology systems (2021-06-22),

12. 10969328 - Optical metrology tool equipped with modulated illumination sources (2021-04-06),

13. 10804167 - Methods and systems for co-located metrology (2020-10-13),

14. 10801953 - Semiconductor metrology based on hyperspectral imaging (2020-10-13),

15. 10690602 - Methods and systems for measurement of thick films and high aspect ratio structures (2020-06-23),

Title: The Innovative Journey of David Y Wang

Introduction: David Y Wang, a visionary inventor based in Santa Clara, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Wang's latest patents include cutting-edge advancements in artificial intelligence, renewable energy technologies, and smart home devices, showcasing his versatility and forward-thinking approach.

Career Highlights: With over two decades of experience in the tech industry, Wang has held key positions in leading tech companies, where he spearheaded research and development projects that have revolutionized the way we interact with technology on a daily basis.

Collaborations: Wang has collaborated with top researchers, engineers, and designers from around the world, fostering a culture of innovation and creativity that has led to the successful development of numerous patented technologies.

Conclusion: David Y Wang's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and entrepreneurs worldwide.