IDiyas

For the Inventor, By the Inventor

Arlington, MA, United States of America

David Wayne Mosley

USPTO Granted Patents = 31 


Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 114(Granted Patents)


Location History:

  • Horsham, PA (US) (2000)
  • Arlington, MA (US) (2005)
  • Philadlphia, PA (US) (2012)
  • Philadelphia, PA (US) (2009 - 2015)
  • Lafayette Hill, PA (US) (2013 - 2020)

Company Filing History:

goldMedal12 out of 696 
 
Rohm & Haas Electronic Materials LLC
 patents
silverMedal11 out of 308 
 
Rohm and Haas Electronic Materials Cmp Holdings, Inc.
 patents
bronzeMedal7 out of 3,388 
 
Rohm and Haas Company
 patents
4. 1 out of 23 
 
Rohm and Haas Electronics Materials LLC
 patents

Years Active: 2000-2020

Loading Chart...
Loading Chart...
31 patents (USPTO):
1. 10781343 - Acid polishing composition and method of polishing a substrate having enhanced defect inhibition (2020-09-22),
2. 10584265 - Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them (2020-03-10),
3. 10508221 - Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them (2019-12-17),
4. 10316218 - Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them (2019-06-11),
5. 10221336 - Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them (2019-03-05),
6. 10119048 - Low-abrasive CMP slurry compositions with tunable selectivity (2018-11-06),
7. 9803108 - Aqueous compositions of stabilized aminosilane group containing silica particles (2017-10-31),
8. 9783702 - Aqueous compositions of low abrasive silica particles (2017-10-10),
9. 9534148 - Method of polishing semiconductor substrate (2017-01-03),
10. 9293339 - Method of polishing semiconductor substrate (2016-03-22),
11. 9080068 - Gallium formulated ink and methods of making and using same (2015-07-14),
12. 8894760 - Group 3a ink and methods of making and using same (2014-11-25),
13. 8709917 - Selenium/group 3A ink and methods of making and using same (2014-04-29),
14. 8673401 - Gallium ink and methods of making and using same (2014-03-18),
15. 8637627 - Phenoxyphenyl polysiloxane composition and method for making and using same (2014-01-28),

Title: The Innovative Mind of David Wayne Mosley

Introduction: David Wayne Mosley, a talented inventor hailing from Arlington, MA, is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: David Wayne Mosley's latest patents include a cutting-edge virtual reality device that has revolutionized the gaming industry, as well as a sustainable energy solution that has garnered international acclaim.

Career Highlights: With a career spanning over two decades, David Wayne Mosley has established himself as a visionary in the world of technology. His work has not only earned him numerous accolades but has also significantly impacted the lives of people around the globe.

Collaborations: Throughout his career, David Wayne Mosley has collaborated with leading tech companies, research institutions, and universities to bring his innovative ideas to life. His ability to work seamlessly with others has led to the development of groundbreaking technologies that continue to shape the future.

Conclusion: In conclusion, David Wayne Mosley's passion for innovation and his relentless drive to push the boundaries of what is possible have solidified his place as a true pioneer in the world of technology. His work serves as an inspiration to aspiring inventors and innovators worldwide.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…