Da-Ming Zhuang

Title: Innovator Spotlight: Da-Ming Zhuang

Introduction: Da-Ming Zhuang is a prominent inventor based in Beijing, China, known for his significant contributions to the field of materials science. With a portfolio of nine patents, Zhuang has made notable advancements particularly in the development of sputtering targets.

Latest Patents: Among his latest innovations is a sputtering target that features an indium cerium zinc oxide composition, represented as InCeZnO, where the variable x is 0.5 to 2. This unique sputtering target offers a relative density of 90% or greater, alongside a bulk resistance ranging from approximately 10 Ω·cm to 10 Ω·cm. Furthermore, the crystalline InCeZnO content in this target exceeds 80%. Another patent describes a method for creating a sputtering target by mixing indium oxide, cerium oxide, and zinc oxide powders, followed by sintering at a temperature between 1250°C and 1650°C.

Career Highlights: Zhuang has held influential roles in esteemed organizations such as Tsinghua University, where he has contributed to academic research and innovation in materials technology, and Hon Hai Precision Industry Co., Ltd., a lead player in electronics manufacturing.

Collaborations: Throughout his career, Da-Ming Zhuang has collaborated with several esteemed colleagues, including Ming Zhao and Ming-Jie Cao, enhancing the collective expertise and innovation in their research endeavors.

Conclusion: Da-Ming Zhuang's innovative work in the field of materials science, particularly with sputtering targets, showcases his significant impact on technology and manufacturing. His dedication to research and collaboration continues to drive advancements that have the potential to influence various applications in the industry.