The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Sep. 01, 2015
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Da-Ming Zhuang, Beijing, CN;

Ming Zhao, Beijing, CN;

Li Guo, Beijing, CN;

Ming-Jie Cao, Beijing, CN;

Liang-Qi Ouyang, Beijing, CN;

Leng Zhang, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/08 (2006.01); C23C 14/00 (2006.01); C23C 14/35 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01); C04B 35/457 (2006.01); C04B 35/626 (2006.01); C04B 35/645 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
C23C 14/086 (2013.01); C04B 35/457 (2013.01); C04B 35/6261 (2013.01); C04B 35/6455 (2013.01); C23C 14/0036 (2013.01); C23C 14/3414 (2013.01); C23C 14/35 (2013.01); C23C 14/5806 (2013.01); H01J 37/3429 (2013.01); C04B 2235/40 (2013.01); C04B 2235/604 (2013.01); C04B 2235/6562 (2013.01); C04B 2235/661 (2013.01); C04B 2235/77 (2013.01);
Abstract

A method for making a SnO thin film includes steps of: providing a substrate and a tin oxide sputtering target; spacing the substrate and the tin oxide sputtering target from each other; and sputtering the SnO thin film on the substrate by using a magnetron sputtering method. The tin oxide sputtering target comprises uniformly mixed elemental Sn and SnO. An atomic ratio of Sn atoms and O atoms in the tin oxide sputtering target satisfies 1:2<Sn:O≦2:1.


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