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Years Active: 2017
Title: Innovations of Inventor Leng Zhang
Introduction
Leng Zhang, an accomplished inventor based in Beijing, China, has made significant contributions to the field of semiconductor technologies. With a total of two patented innovations, he has been at the forefront of developing methods that enhance oxide semiconductor films and thin films.
Latest Patents
His latest patents showcase innovative techniques in semiconductor manufacturing. One notable patent is for a "Method for making tin oxide thin film," which includes detailed steps such as providing a substrate and a tin oxide sputtering target. The process involves spacing the substrate and the target, followed by sputtering the SnO thin film using a magnetron sputtering method. The tin oxide sputtering target is designed with a precise atomic ratio of tin (Sn) and oxygen (O), promoting enhanced performance in semiconductor applications.
Another important patent by Leng Zhang details an "Oxide semiconductor film," which contains elements such as indium (In), cerium (Ce), and zinc (Zn). The patent outlines a method for forming this oxide film on a substrate through a sputtering process using a tailored sputtering target comprising InCeZnO. This innovative approach is critical for developing efficient oxide semiconductor films.
Career Highlights
Throughout his career, Leng Zhang has collaborated with esteemed institutions and companies. He has held positions at Tsinghua University, one of China's leading research universities, where he contributed to advancing semiconductor research. He has also worked at Hon Hai Precision Industry Co., Ltd., a globally recognized manufacturer known for its innovation in electronics and technology.
Collaborations
In his professional journey, Leng Zhang has worked alongside notable individuals such as Da-Ming Zhuang and Ming Zhao. These collaborations have fostered a rich environment for innovation, leading to significant advancements in the field of semiconductor technologies.
Conclusion
Leng Zhang's contributions to the field of innovation through his patents and collaborative efforts underscore his importance as an inventor within the semiconductor industry. His work continues to influence advancements in technology, promoting further research and innovation in oxide semiconductor applications.