Portland, OR, United States of America

Chung-Hsun Lin

USPTO Granted Patents = 15 

Average Co-Inventor Count = 7.8

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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15 patents (USPTO):Explore Patents

Title: Innovations of Chung-Hsun Lin

Introduction

Chung-Hsun Lin is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuitry, holding a total of 15 patents. His work focuses on enhancing the performance and efficiency of high voltage and low voltage transistor stack structures.

Latest Patents

Among his latest patents is the innovation titled "Dipole threshold voltage tuning for high voltage transistor stacks." This invention involves integrated circuitry that comprises high voltage (HV) and low voltage (LV) ribbon or wire (RoW) transistor stack structures. In this design, a gate electrode of the HV and LV transistor stack structures may include the same work function metal. Additionally, a metal oxide may be deposited around one or more channels of the HV transistor stack, thereby altering the dipole properties of the gate insulator stack from those of the LV transistor stack structure.

Another notable patent is "Gate-all-around integrated circuit structures having devices with channel-to-substrate electrical contact." This patent describes integrated circuit structures that include a first vertical arrangement of horizontal nanowires above a first fin. The channel region of this arrangement is electrically coupled to the first fin by a semiconductor material layer. Furthermore, a second vertical arrangement of horizontal nanowires is described, which is above a second fin, with its channel region electrically isolated from the second fin.

Career Highlights

Chung-Hsun Lin is currently employed at Intel Corporation, where he continues to innovate and develop advanced technologies in the semiconductor industry. His work has significantly impacted the design and functionality of modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Biswajeet Guha and Tahir Ghani, contributing to various projects that enhance the capabilities of integrated circuits.

Conclusion

Chung-Hsun Lin's contributions to the field of integrated circuitry and his innovative patents demonstrate his expertise and commitment to advancing technology. His work at Intel Corporation continues to influence the future of electronic devices and semiconductor technology.

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