This inventor holds 15 USPTO granted patents and 3 published patent applications. Top assignees: Nan Ya Technology Corporation, Micron Technology Incorporated. Active years: 2011-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hsinchu, TW (2011 - 2013)
- Taoyuan County, TW (2012 - 2015)
- Boise, ID (US) (2013 - 2015)
Company Filing History:
11 out of 2,580 
4 out of 39,222 
Years Active: 2011-2015
Title: The Innovative Journey of Inventor Chun-I Hsieh
Introduction
Chun-I Hsieh, an esteemed inventor based in Taoyuan County, Taiwan, has made significant contributions to the field of semiconductor technology and capacitor fabrication. With a remarkable portfolio of 15 patents, Hsieh's work is characterized by innovative methods and techniques that enhance the efficiency and performance of electronic components.
Latest Patents
Among his latest inventions, Hsieh has developed a groundbreaking method for fabricating capacitors that utilize rutile titanium oxide dielectric films. This method involves a multi-step process, which includes forming a bottom electrode, applying a template layer, and conducting atomic layer deposition (ALD) cycles using water vapor as an oxidant. The final phase of this process transforms the titanium dioxide layer into a rutile phase, resulting in enhanced capacitor performance.
Additionally, Hsieh has pioneered methods for forming capacitors and semiconductor devices that incorporate rutile titanium dioxide materials. This includes innovative techniques such as forming titanium nitride and ruthenium materials within apertures defined by support materials, leading to the creation of advanced semiconductor devices with improved functionalities.
Career Highlights
Chun-I Hsieh has built a noteworthy career, having worked with prominent companies in the technology sector. He has been associated with Nan Ya Technology Corporation and Micron Technology Incorporated, where he has contributed his expertise to various projects and innovations. His dedication and creativity in the field have propelled advancements in semiconductor technologies and device fabrication.
Collaborations
Throughout his career, Hsieh has collaborated with notable professionals such as Chang-Rong Wu and Vishwanath Bhat. These partnerships have fostered a collaborative atmosphere that stimulates innovation and the successful development of advanced technologies.
Conclusion
Chun-I Hsieh's contributions to the field of technology, particularly in semiconductor fabrication and capacitor design, demonstrate his status as a leading inventor. With 15 patents to his name and a commitment to advancing innovative methods, Hsieh continues to leave an indelible mark on the industry, influencing the future of electronic components and systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile