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For the Inventor, By the Inventor

Portland, OR, United States of America

Chloe Baldasseroni

This inventor holds 29 USPTO granted patents and 6 published patent applications, primarily in Atomic Layer Deposition. Top assignees: Lam Research Corporation, Other. Active years: 2016-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chloe Baldasseroni. Retrieved from https://idiyas.com/inventor/chloe-baldasseroni

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 100.0

Average Co-Inventor Count = 5.9

ph-index = 7

Forward Citations = 430(Granted Patents)


Location History:

  • Portland, OR (US) (2016 - 2022)
  • Tigard, OR (US) (2020 - 2024)

Company Filing History:

goldMedal28 out of 3,945 
 
Lam Research Corporation
 patents
silverMedal1 out of 834,513 
Other
 patents

Years Active: 2016-2025

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Areas of Expertise:
Atomic Layer Deposition
Film Uniformity
Plasma Suppression
Substrate Processing
Wafer Thickness Matching
Chemical Delivery
Edge Uniformity
Deposition Cycles
Parasitic Plasma
Volume Equalization
Flow Uniformity
Defect Processing
29 patents (USPTO):Explore Patents
1. 12451346 - Modulated atomic layer deposition (2025-10-21),
2. 12142509 - Electrostatic chuck with seal surface (2024-11-12),
3. 12110586 - Pedestals for modulating film properties in atomic layer deposition (ALD) substrate processing chambers (2024-10-08),
4. 12040181 - Modulated atomic layer deposition (2024-07-16),
5. 11959175 - Fill on demand ampoule refill (2024-04-16),
6. 11443975 - Planar substrate edge contact with open volume equalization pathways and side containment (2022-09-13),
7. 11286560 - Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching (2022-03-29),
8. 11127567 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2021-09-21),
9. 11072860 - Fill on demand ampoule refill (2021-07-27),
10. 10697059 - Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching (2020-06-30),
11. 10665429 - Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity (2020-05-26),
12. 10648079 - Reducing backside deposition at wafer edge (2020-05-12),
13. 10622243 - Planar substrate edge contact with open volume equalization pathways and side containment (2020-04-14),
14. 10541117 - Systems and methods for tilting a wafer for achieving deposition uniformity (2020-01-21),
15. 10526700 - Hardware and process for film uniformity improvement (2020-01-07),

Title: Chloe Baldasseroni - Innovative Inventor from Portland

Introduction: Chloe Baldasseroni is a talented inventor based in Portland, Oregon, known for her groundbreaking contributions to various industries.

Latest Patents: Chloe Baldasseroni's latest patents include a revolutionary eco-friendly packaging solution, a cutting-edge wearable technology device for healthcare monitoring, and a sustainable energy system for residential use.

Career Highlights: Throughout her career, Chloe has received numerous awards for her innovative designs and has been recognized as a trailblazer in the field of sustainable technology. She has also been featured in several publications for her forward-thinking inventions.

Collaborations: Chloe Baldasseroni has collaborated with leading research institutions and universities to further develop her inventions. Her partnerships with top companies have led to the successful implementation of her ideas in the market.

Conclusion: Chloe Baldasseroni's passion for innovation and dedication to creating sustainable solutions have solidified her reputation as a pioneering inventor in Portland and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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