The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Nov. 10, 2015
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Shankar Swaminathan, Beaverton, OR (US);
Pramod Subramonium, Portland, OR (US);
Frank L. Pasquale, Beaverton, OR (US);
Jeongseok Ha, Portland, OR (US);
Chloe Baldasseroni, Portland, OR (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01L 21/687 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32715 (2013.01); C23C 16/4585 (2013.01); H01J 37/32733 (2013.01); C23C 16/458 (2013.01); H01J 2237/20207 (2013.01); H01L 21/68785 (2013.01);
Abstract
Heights of carrier ring supports are increased at a side of a wafer that is located closer to a spindle of a plasma chamber. The heights are increased relative to a height of a carrier ring support that is located closer to side walls of the plasma chamber. The increase in the height results in an increase in thickness of a thin film deposited on the wafer to further achieve uniformity in thickness of the thin film across a top surface of the wafer.