Jeongseok Ha

Title: Jeongseok Ha: Innovator in Plasma Processing Technology

Introduction

Jeongseok Ha is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on methods to enhance the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Latest Patents

One of Jeongseok Ha's latest patents is a method to clean SnO film from a processing chamber. This innovative plasma processing system includes a hydrogen gas supply and a hydrocarbon gas supply, along with a processing chamber. The system features a first mass flow controller (MFC) for regulating hydrogen gas flow and a second MFC for hydrocarbon gas flow. A plasma source generates plasma within the processing chamber, which is utilized for etching SnO. The controller ensures that the ratio of hydrocarbon gas flow to hydrogen gas flow is maintained between 1% and 60%. This careful regulation allows for the production of SnH gas, which reacts with hydrocarbon gas to create an organotin compound. This compound can be volatilized, preventing Sn powder from depositing on the chamber surfaces during the etching process.

Another patent by Jeongseok Ha outlines a method for cleaning SnO residue from a processing chamber. This method involves introducing hydrocarbon and hydrogen gas at a ratio of 1%-60% into the plasma processing system. The plasma generated etches the SnO residue from the chamber surfaces, producing SnH gas that reacts with the hydrocarbon gas to form a volatilizable organotin compound. The method also includes evacuating the processing chamber of this compound, thereby reducing the rate of SnH gas decomposition into Sn powder.

Career Highlights

Jeongseok Ha is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and refine his innovative approaches to plasma processing technology.

Collaborations

Throughout his career, Jeongseok Ha has collaborated with talented individuals such as Akhil N Singhal and Dustin Zachary Austin. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Jeongseok Ha's contributions to plasma processing technology have made a significant impact in the semiconductor industry. His innovative methods for cleaning SnO