The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Aug. 09, 2018
Lam Research Corporation, Fremont, CA (US);
Akhil Singhal, Beaverton, OR (US);
Dustin Zachary Austin, Corvallis, OR (US);
Jeongseok Ha, Portland, OR (US);
Pei-Chi Liu, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for cleaning SnOresidue from a processing chamber is provided as one embodiment. The method embodiment includes introducing hydrocarbon and hydrogen gas at a ratio of 1%-60% into a plasma processing system. The SnOresidue is etched from surfaces the processing chamber using plasma generated by a plasma source, which produces SnHgas. The SnHgas reacts with the hydrocarbon gas to produce an organotin compound that is volatilizable. The method further provides for evacuating the processing chamber of the organotin compound. The introduction of the hydrocarbon gas along with the hydrogen gas at the ratio of 1%-60% reduces a rate of SnHgas decomposition into Sn powder.