The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
May. 22, 2015
Lam Research Corporation, Fremont, CA (US);
Tuan Nguyen, Beaverton, OR (US);
Eashwar Ranganathan, Tigard, OR (US);
Shankar Swaminathan, Beaverton, OR (US);
Adrien LaVoie, Newberg, OR (US);
Chloe Baldasseroni, Portland, OR (US);
Ramesh Chandrasekharan, Portland, OR (US);
Frank L. Pasquale, Beaverton, OR (US);
Jennifer L. Petraglia, Portland, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
Methods and apparatus for use of a fill on demand ampoule are disclosed. The fill on demand ampoule may refill an ampoule with precursor concurrent with the performance of other deposition processes. The fill on demand may keep the level of precursor within the ampoule at a relatively constant level. The level may be calculated to result in an optimum head volume. The fill on demand may also keep the precursor at a temperature near that of an optimum precursor temperature. The fill on demand may occur during parts of the deposition process where the agitation of the precursor due to the filling of the ampoule with the precursor minimally effects the substrate deposition. Substrate throughput may be increased through the use of fill on demand.